Products
  • Automatic Edge Grinding Machine
  • Automatic Edge Grinding Machine
  • Automatic Edge Grinding Machine
  • Automatic Edge Grinding Machine
  • Automatic Edge Grinding Machine
  • Automatic Edge Grinding Machine
  • Automatic Edge Grinding Machine
  • Automatic Edge Grinding Machine
  • Automatic Edge Grinding Machine
  • Automatic Edge Grinding Machine
  • Automatic Edge Grinding Machine
  • Automatic Edge Grinding Machine
Automatic Edge Grinding Machine

Main Purposes:

It is mainly used for silicon, sapphire, silicon carbide, gallium arsenide and other semiconductor materials; High precision double chamfering and edging of various polycrystalline or flying polycrystalline materials such as optical glass, quartz glass, and other hard and brittle materials.

Product Details

Equipment Characteristics:

1. The machine can chamfer 6/8 inch wafer.

2. Two wafers can be chamfered at the same time, and rough grinding and fine grinding can be realized by one key.

3. The design is equipped with five 6-inch and 8-inch Cassette box.

4. It has the function of automatic cleaning and drying, so that the dry in and dry out can be achieved.

5. All processes are fully automatic, and each step is handled by a manipulator.

6. The calibration and measurement of wafer are completed by CCD visual positioning. The diameter, of edge, center distance and size measurement of wafer before and after trimming are automatically completed by CCD visual matching program algorithm.

Technical Specifications:

Grinding wheel stroke

100mm

CCD positioning pixel accuracy

2.5 μm

Fast feed speed of grinding wheel

10 mm/s

Handling X-axis travel

1350mm

Minimum motion resolution of grinding wheel

0.5μm

Repeat positioning accuracy of each axis

2 μm

Diameter of main grinding wheel

202 mm

End face runout of grinding platform

5μm

Thickness measurement resolution

0.1μm

Concentricity of product and grinding table

±3μm

Clamping table type

Porous sucker

Vacuum limit pressure

-90 KPa

Wafer clamping mode

by suction

Chamfer accuracy

±20μm(Condition: grinding wheel angle 45°,TTV±10μm)

Bearing plate spindle speed

0~35rpm

Wafer roundness control capability

<10μm

Suction cup cleaning method

Bench air recoil

Angle control capability

+/-0.1°

Wafer processing flow

Same box process

Power

380V-15kW

water cleaning

Cleaning and drying through water air two fluid nozzle

Weight

≈2000kg

Wafer positioning mode

3 CCD visual positioning centers and straight edges

Overall dimensions

2295x1275x2000mm

Inquiry
Contact Us
Contact person: Grace
Phone: +86 13622378685
Email: Grace@lapping-machine.com
Address:Building 34, Zone B, Yuanshan Industrial Zone, Xiangcheng Road, Guangming District, Shenzhen,China

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Shenzhen Tengyu Grinding Technology Co., Ltd.