Optical Thin Film Sputtering Coater
NSC-15 is a load-lock type metal-mode sputtering system with high performance and productivity. It is suitable for deposition of various filters such as AR + anti-smudge coating for mobile devices and automotive panels, decorative coating for 5G compatible smartphones, and BPF and LWPF for sensors.
FEATURES:
1. 4 kinds of target materials at maximum
2. Replacement of cathode with other component
3. Dual rotary cylindrical cathod for stable discharge
4. High reactive plasma source for low absorption film
5. Low particle density film by opimizing deposition and transfer systems
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Specifications of NSC-0508
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Vacuum Chamber |
LL Room: SUS304, W500 mm×D800 mm×H2890 mm |
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Substrate Holder |
Selectable 13 - 22 pcs a holder |
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Rotary substrate drum system |
φ1500 mm, Drum Type, 10 rpm - 100 rpm (Variable) |
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Reaction source |
ICP (Inductively coupled plasma) |
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Sputtering source |
Dual rotary cathode (Planer type as option) |
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Evacuation system |
Roughing pump, Turbo molecular pump |
|
Performance |
|
|
Ultimate Pressure |
LL chamber: 10 Pa |
|
Pump Down Rate |
LL chamber: ≤20 min (from atmospheric to 1.0 × 10-1 Pa) |
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Setting substrate |
150℃ as option |
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Utility Requirements |
|
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Footprint |
5800 mm (W) × 7700 mm (D) × 3200 mm (H) |
|
Power Supply |
3-phase + N + G, 380V ± 10%, 130kVA, 50/60Hz |
|
Cooling Water Flow Rate |
233 Q /min or greater |
|
Compressed Air Pressure |
0.5 MPa - 0.7 MPa |
|
Gross Weight |
16000 kg approx. |
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