Optical Thin Film Sputtering Coater
NSC-2350 is metal mode sputter for optical thin film and, especially, optimal system for large area substrates.
The AR+AS flms for panels of mobile terminal device, automobile, etc.
FEATURES:
1. Large coating area: H1100 mm × W450 mm at max
2. 6 Cathodes at Maximum
3. Replacement of cathode with optional component
4. High reactive plasma source for low absorption film
5. Load-lock type substrate holder tranfer system
6. Low particle film by opimizing deposition and transfer systems
7. AR/AS Coating By One Process
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Specifications of NSC-0718
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Vacuum Chamber |
LL Room：SUS304, W700 × H1860 × D1760 mm |
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PR Room：SUS304, φ2350 × H1950 mm |
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Substrate Holder |
Selectable 15 - 22 pcs |
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Rotary substrate drum system |
φ2245 mm, Drum Type, 10 rpm - 50 rpm (Tunable) |
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Reaction source |
ICP (Inductively coupled plasma) |
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Sputtering source |
Dual Rotary cathode (Planer type as option) |
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Evacuation system |
Roughing pump, Turbo molecular pump, Meissner chiller |
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Performance |
|
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Ultimate Pressure |
LL Room: 10 Pa |
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Pump Down Rate |
LL Room: 8 min (from atmospheric to 10 Pa) |
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Utility Requirements |
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Footprint |
7000 mm (W) × 6600 mm (D) × 4000 mm (H) |
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Power Supply |
3-phase + N + G, 380V ± 5%, 300kVA, 50/60Hz |
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Min. Water Flow Rate |
400 Q /min or greater (Pressure：0.6 - 0.7 Mpa) |
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Compressed Air Pressure |
0.5 MPa - 0.7 MPa |
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Gross Weight |
30000 kg approx. |
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