Optical Wafer Level Sputtering Coater
OWLS-1800 is a horizontal metal-mode sputter for wafer-level optics (WLO) coating.
The system can coat directly bandpass filters on device wafers utilized for TOF and proximity sensors.
FEATURES:
1. Up to 12" wafers
2. Planetary wafer rotation system
3. Designed for low particle coating
4. Optical thickness monitor (option)
5. EFEM Integration and SEMI standards compliance (option)
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Specifications of OWLS-1800
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Vacuum Chamber |
LL Room TR Room PR Room |
|
Substrate Holder |
10 pcs (Max 12 inch) |
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Rotary Substrarte Drum System |
φ1800 mm, Turntable type, |
|
Reaction Source |
ICP (Inductively coupled plasma) |
|
Sputtering Source |
Dual rotary cathode (Planer type available as an option) |
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Evacuation System |
Roughing pump, Turbo molecular pump, Meissner chiller |
|
Performance |
|
|
Ultimate Pressure |
LL Room, TR Room：10 Pa PR Room：≤5.0 × 10-4 Pa |
|
Pump Down Rate |
LL Room, TR Room：5 min (From atmospheric to 10 Pa) PR Room：40 min (From atmospheric to 5.0 × 10-3 Pa) |
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Utility Requirements |
|
|
Footprint |
6500 mm (W) × 6000 mm (D) × 3000 mm (H) |
|
Power Supply |
3-phase + N + G, 380V ± 5%, 150 kVA, 50/60 Hz |
|
Min. Water Flow Rate |
215 Q /min or greater |
|
Air Pressure |
0.5 - 0.7 MPa |
|
Weight |
13500 kg approx. |
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